A REM study of inhomogeneous stress fields induced by the interfacial steps at In0.2Ga0.8As/GaAs interface

Jian Jiang,Xiaochuan Zhou,Anyan Du,L.-M. Peng,Enge Wang,Shanming Mu,Zhantian Zhong
DOI: https://doi.org/10.1006/spmi.1993.1074
IF: 3.22
1993-01-01
Superlattices and Microstructures
Abstract:Inhomogeneous stress fields (ISF) were observed, for the first time, in the dislocation-free regions at the interfaces of MBE grown In 0.2 Ga 0.8 As/GaAs heterostructures by reflection electron microscopy (REM). The ISF is proposed to be induced by interfacial roughness, or in other words, interfacial steps. A calculation was carried out to correlate the stress fields due to the In 0.2 Ga 0.8 As/GaAs interfacial steps with the REM observations. Towards the end of the paper, we will discuss the possible effects of ISF on the electron-transport properties of the strained layer materials.
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