X-ray Evaluation on Residual Stresses in Vapor-Deposited Hard Coatings

KW XU,J CHEN,RS GAO,JW HE,C ZHAO,SH LI
DOI: https://doi.org/10.1117/12.47289
1991-01-01
Abstract:Residual stresses in plasma assisted vapor deposited (PECVD) TiN coatings were evaluated with x-ray diffraction method. They are tensile on substrate of cemented carbide, but compressive on that of steel. The magnitude is between those made by chemical vapor deposition (CVD) and physical vapor deposition (PVD). The residual stresses display different values on a substrate of steel or cemented carbide, yet no distinct change on substrates of various kinds of steels or of cemented carbides. As the depositing temperature increases, both the macro and the micro residual stress represented by the relative displacement and the broadening of diffraction profile decrease. This implies that the stresses produced by PECVD in normally lower temperature are dominated mainly by the constituents and microstructural aspects of the coating material rather than by different thermal expansions between the coating and the substrate.
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