Abstract:GaN on Si plays an important role in the integration and promotion of GaN-based wide-gap materials with Si-based integrated circuits (IC) technology. A series of GaN film materials were grown on Si (111) substrate using a unique plasma assistant molecular beam epitaxy (PA-MBE) technology and investigated using multiple characterization techniques of Nomarski microscopy (NM), high-resolution X-ray diffraction (HR-XRD), variable angular spectroscopic ellipsometry (VASE), Raman scattering, photoluminescence (PL), and synchrotron radiation (SR) near-edge X-ray absorption fine structure (NEXAFS) spectroscopy. NM confirmed crack-free wurtzite (w-) GaN thin films in a large range of 180–1500 nm. XRD identified the w- single crystalline structure for these GaN films with the orientation along the c-axis in the normal growth direction. An optimized 700 °C growth temperature, plus other corresponding parameters, was obtained for the PA-MBE growth of GaN on Si, exhibiting strong PL emission, narrow/strong Raman phonon modes, XRD w-GaN peaks, and high crystalline perfection. VASE studies identified this set of MBE-grown GaN/Si as having very low Urbach energy of about 18 meV. UV (325 nm)-excited Raman spectra of GaN/Si samples exhibited the GaN E2(low) and E2(high) phonon modes clearly without Raman features from the Si substrate, overcoming the difficulties from visible (532 nm) Raman measurements with strong Si Raman features overwhelming the GaN signals. The combined UV excitation Raman–PL spectra revealed multiple LO phonons spread over the GaN fundamental band edge emission PL band due to the outgoing resonance effect. Calculation of the UV Raman spectra determined the carrier concentrations with excellent values. Angular-dependent NEXAFS on Ga K-edge revealed the significant anisotropy of the conduction band of w-GaN and identified the NEXAFS resonances corresponding to different final states in the hexagonal GaN films on Si. Comparative GaN material properties are investigated in depth.

Structural Study Of Chemical Vapor Deposition Of Si On Gan

Synthesis and Characterization of Heteroepitaxial Gan Films on Si(111)

X-ray Diffraction, Photoluminescence and Secondary Ion Mass Spectroscopy Study of GaN Films Grown on Si(111) Substrate by Vacuum Reactive Evaporation

Nitrogen Diffusion in the Si Growth on GaN by Low-Pressure Chemical Vapor Deposition

Investigation Of Preparation And Properties Of Epitaxial Growth Gan Film On Si(111) Substrate

Impact of GaN Transition Layers in the Growth of GaN Epitaxial Layer on Silicon

Investigation of GaN layer grown on Si(1 1 1) substrate using an ultrathin AlN wetting layer

SIMS and XPS studies of GaN epilayers grown on Si substrates

Epitaxial Growth Of Wurtzite Gan On Si(111) By A Vacuum Reactive Evaporation

Study of Si and Ge growth on Si(100) surface

Partially Crystallized Ultrathin Interfaces Between GaN and SiNx Grown by Low-Pressure Chemical Vapor Deposition and Interface Editing

Ge-Dot/Si Multilayered Structures Through Ni-Induced Lateral Crystallization

Chemical Structures Of Algan/Aln/Si (111) By Mocvd Using Aes And Xps

Chemical Vapor Deposition of Ge on GaN/Al2O3(0001) Substrates

Secondary Ion Mass Spectroscopy and Photoluminescence Investigations on the Gan Epilayer Grown on Si Substrate

Study of GeSi Alloy Deposition on Ge Substrate by Very Low-Pressure Chemical Vapor Deposition

Optical, Structural, and Synchrotron X-ray Absorption Studies for GaN Thin Films Grown on Si by Molecular Beam Epitaxy

Epitaxy of SiGe Layers by Ultrahigh Vacuum Chemical Vapor Deposition

Investigation of preparation and properties of epitaxial growth GaN film on Si(1 1 1) substrate

Interface Investigation on SiGe/Si Multilayer Structures: Influence of Different Epitaxial Process Conditions

Study of Si Epitaxy on Porous Si by Ultrahigh Vacuum Chemical Vapor Deposition