A Self-Aligned Double-Gate Polysilicon Tft Technology

shengdong zhang,ruqi han,johnny k o sin,mansun chan
DOI: https://doi.org/10.1109/ISDRS.2001.984527
2001-01-01
Abstract:In this paper, a simple self-aligned double-gate TFT (SADG TFT) technology is demonstrated for the first time, which has a number of advanced features including: (1) self-aligned top and bottom gate; (2) extremely thin channel (body) for higher current drive and scalability; (3) self-aligned thick source/drain region to reduce series resistance and drain electric field; and (4) metal-induced unilateral crystallization (MIUC) for poly-Si grain size enhancement
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