Metal–semiconductor–metal GaN Ultraviolet Photodetectors on Si(111)

ZM Zhao,RL Jiang,P Chen,DJ Xi,ZY Luo,R Zhang,B Shen,ZZ Chen,YD Zheng
DOI: https://doi.org/10.1063/1.127004
IF: 4
2000-01-01
Applied Physics Letters
Abstract:GaN metal–semiconductor–metal photoconductive detectors have been fabricated on Si(111) substrates. The GaN epitaxial layers were grown on Si substrates by means of metalorganic chemical-vapor deposition. These detectors exhibited a sharp cutoff at the wavelength of 363 nm and a high responsivity at a wavelength from 360 to 250 nm. A maximum responsivity of 6.9 A/W was achieved at 357 nm with a 5 V bias. The relationship between the responsivity and the bias voltage was measured. The responsivity saturated when the bias voltage reached 5 V. The response time of 4.8 ms was determined by the measurements of photocurrent versus modulation frequency.
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