A Study of Al0.3Ga0.7N Metal-semiconductor-metal UV Photodiodes

Cai-jing CHENG,Jun-jie SI,Zheng-xiong LU,Yun-zhi GUO,Hong-yan ZHAO,lan ZHAO,Jia-xin DING,Wei-guo SUN,Zhi-zhong CHEN,Guo-yi ZHANG
DOI: https://doi.org/10.3969/j.issn.1001-8891.2006.08.009
2006-01-01
Abstract:A metal-semiconductor-metal ultraviolet photodetector was fabricated on undoped n-Al0.3Ga0.7N grown by metalorganic chemical vapor deposition(MOCVD).Dark current of the device was 1nA at bias of 5.3 V.The detector exhibited a sharp cutoff at 315 nm wavelength with peak responsivity of 0.023 A/W at bias of 1.0V and 305 nm.The responsivity could be further improved by Optimizing structure parameters such as decreasing the finger width.The ideality factor n of 1.05 and the zero-bias barrier height φB0 of 1.16 eV were obtained in I-V measurement and indicated the Schottky was formed ideally.
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