Low temperature atomic layer deposition of GaO x N y thin film on III-GaN:Mg for UV photodetector

Longxing Su,Sheng-Yu Chen,Lianqi Zhao,Yuqing Zuo,Jin Xie
DOI: https://doi.org/10.1063/5.0031097
IF: 4
2020-11-23
Applied Physics Letters
Abstract:In this work, a UV photodetector was fabricated by constructing a heterojunction between <i>β</i> phase GaO<sub>x</sub>N<sub>y</sub> prepared by atomic layer deposition and <i>p</i>-GaN prepared by metal organic chemical vapor deposition. The <i>p</i>-GaN layer shows an extremely sharp absorption characteristic with a cutoff edge of ∼365 nm, while <i>β</i>-GaO<sub>x</sub>N<sub>y</sub> shows a broad absorption behavior in the UV region due to its low crystal quality grown at low temperature (200 °C). The <i>β</i>-GaO<sub>x</sub>N<sub>y</sub>/GaN photodetector exhibits an obvious rectifying characteristic due to the formation of the type-II heterojunction and shows a high responsivity of 1.46 A/W at a bias voltage of −5 V and a rapid response speed (a rise time of 3.3 ms and a decay time of 6.8 ms). The investigation of the <i>β</i>-GaO<sub>x</sub>N<sub>y</sub>/GaN photodetector suggests a simple and effective strategy for next-generation high-performance optoelectronic devices.
physics, applied
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