High Responsivity GaN Ultraviolet Photodetector

沙金,江若琏,周建军,刘杰,沈波,张荣,郑有炓
DOI: https://doi.org/10.3969/j.issn.1001-5868.2003.03.008
2003-01-01
Abstract:GaN epilayers were grown on sapphire substrates by metal-organic chemical vapor deposition, with low-temperature GaN as the buffer layer. Metal-semiconductor-metal photoconductive detectors were fabricated using this material. The spectrum response shows a high sensitivity at a wavelength from 330 to 360 nm, with a sharp cutoff at the wavelength of near 360 nm, which means there is no response in the visible and infrared region. The maximum responsivity is 1 200 A/W at 358 nm under 5 V bias. The effect of front-and back-illumination on detectors' responsivity was investigated, and the causes of the effect were discussed.
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