An Ultraviolet Photodetector Based On Gan/Si

Zz Ye,X Gu,Jy Huang,Y Wang,Qh Shao,Bh Zhao
DOI: https://doi.org/10.1142/S0217979202015327
2002-01-01
International Journal of Modern Physics B
Abstract:Single crystalline GaN is grown on Si(111) by a vacuum reactive evaporation method. X-ray diffraction(XRD), scanning electron microscopy(SEM), photoluminescence measurement (PL), and Hall measurement results indicate that single crystalline wurtzite GaN film is grown on the microcrystalline GaN buffer layer on Si(111) substrate. The photoconductive ultraviolet photodetector with a metal-semiconductor-metal(MSM) structure is prepared on the unintentionally doped n-type GaN film and the properties of the detector are investigated. The detector has a peak photocurrent responsivity at 365nm and a abrupt cut-off curve. ne responsivity increased with the increasing of bias voltage. The responsivity saturated when the bias voltage reached 7V. The response time was ms level under normal conditions and dropped with the increase of bias voltage before the bias voltage reached its saturation.
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