Abstract:The studies on the thermal deposition of transition metal coordination compounds have been directly motivated by the development of organometallic chemical vapor deposition (OMCVD) technique. Among these compounds Cu(II) acetylacetonate, Cu(acac)2, is a potentially important precursor for the deposition of Cu film and preparation of high T(c) superconducting films. However, little information about the kinetics of thermal decomposition of this compound is available. In this paper we report a kinetic study on the deposition of copper film by decomposing Cu(acac)2. A CW CO2 laser is used to heat a quartz substrate and to induce thermal decomposition on the surface. The deposition rate is measured in situ by monitoring the transmittance of the Cu film on the substrate with a He-Ne laser. As the CO2 laser beam only heats the quartz window, the temperature of the reaction cell can be controlled. The dependence of the deposition rate on the laser intensity is determined at a given vapor pressure of Cu(acac)2 and a laser intensity threshold has been observed. Above the threshold the deposition rate increases linearly with laser intensity in the low intensity region. The laser-induced temperature rise of the substrate and the deposition rate constant have been calculated. The Arrhenius plot is linear and the activation energy for thermal deposition of Cu(acac)2 is 181 +/- 19 kJ. mol-1. In higher laser intensity region the deposition rate becomes independent on the laser intensity, but is a function of the vapor pressure of Cu(acac)2. The decomposition of Cu(acac)2 has been found to be first order. The rate-controlling stop seems to be the surface reaction on the substrate at low laser intensity, while the transport of precursor molecules is crucial at high laser intensity.

Laser-Induced Chemical-Vapor Deposition of Copper with A Cw Co2-Laser

KINETICS ON THE THERMAL DEPOSITION OF COPPER(II) ACETYLACETONATE

Experiment Study of Laser Thermal Enhanced Electrochemical Deposition

Electroless Deposition of Confined Copper Layers Based on Selective Activation by Pulsed Laser Irradiation

Study on plasma deposition of copper induced by nanosecond fiber laser

In Situ Laser Synthesis of Co/Cu Composite Coating on Copper Substrate and Its Microstructural Evolution

Chemical Vapor Deposition Mechanism of Copper Films on Silicon Substrates

The Investigations of Laser‐Enhanced Copper Plating on a Good Heat Conducting Copper Foil

Laser-induced localized and maskless electrodeposition of micro-copper structure on silicon surface: Simulation and experimental study

Effect of optical properties on the thermal responses of copper films induced by ultrafast lasers

Characterization of Chemical Vapor Deposited Copper Films on Mercaptan Self-Assembled Monolayer Diffusion Barriers

Two-temperature molecular dynamics simulation study of copper thin film irradiation with femtosecond and picosecond laser pulses

Temporal-Spatial Measurement of Surface Morphological Evolution Time in Nanosecond Laser Irradiation on the Copper Film

Laser deposition of copper alloy

Laser-induced Chemical Vapor Deposition Diamondlike Film

A STUDY OF LASER-ENHANCED ELECTRODEPOSITION PROCESS OF COPPER

Nanostructural features in nanoporous copper coatings fabricated by laser deposition

Selective Deposition of Conductive Copper Films on Glass Surfaces Using Femtosecond Laser Surface Modification and Electroless Plating

Copper circuits fabricated on flexible polymer substrates by a high repetition rate femtosecond laser-induced selective local reduction of copper oxide nanoparticles.

Enhanced Cvd of Copper Films on Self-Assembled Monolayers As Ultrathin Diffusion Barriers

Deposition of thermal and hot-wire chemical vapor deposition copper thin films on patterned substrates