Effects of Hydrogen on Er/p-type Si Schottky-barrier Diodes.

ZM WANG,YX ZHANG,K WU,MH YUAN,WX CHEN,GG QIN
DOI: https://doi.org/10.1103/physrevb.51.7878
1995-01-01
Abstract:Metal Er was deposited onto 〈100〉-oriented B-doped p-type crystalline silicon wafers, with or without plasma hydrogen treatment, to form Er/p-type Si Schottky barriers. The current-voltage and activation energy measurements reveal that hydrogen decreases the Schottky-barrier height (SBH) of Er/p-type Si by 0.10--0.12 eV, and, at the same time, the ideality factor is decreased from 1.17 to 1.08. The reason why hydrogen decreases the SBH and the ideality factor of Er/p-type Si and increases those of Al/p-type Si [Y. Q. Jia and G. G. Qin, Appl. Phys. Lett. 56, 641 (1991)] is that the main role of hydrogen is either passivating or generating the defects on the metal-semiconductor interface in Er/p-type Si and Al/p-type Si, respectively.
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