Growth of Phosphorus-Doped P-Type ZnO Thin Films by MOCVD
Zhizhen Ye,Jingrui Wang,Yazhen Wu,Xincui Zhou,Fugang Chen,Weizhong Xu,Yan Miao,Jingyun Huang,Jianguo Lü,Liping Zhu,Binghui Zhao
DOI: https://doi.org/10.1007/s12200-008-0024-2
2008-01-01
Frontiers of Optoelectronics in China
Abstract:Phosphorus-doped p-type ZnO thin films are prepared on glass substrates by metalorganic chemical vapor deposition (MOCVD). DEZn, O2, and P2O5 powders are used as reactant and dopant sources. The p-type ZnO films are grown at a temperature between 673 K and 723 K. The best p-type sample has a low resistivity of 4.64 Ω·cm, a hole concentration of 1.61 × 1018 cm−3, and a Hall mobility of 0.838 cm2·(V·s)−1 at room temperature. A strong emission peak at 3.354 eV corresponding to neutral acceptor bound excitons is observed at 77 K in the photoluminescence spectra, which further verifies the p-type characteristics of the films.