Abstract:Nanogrooves with high aspect ratios possess small size effects and high-precision optical control capabilities, as well as high specific surface area and catalytic performance, demonstrating significant application value in the fields of optics, semiconductor processes, and biosensing. However, existing manufacturing methods face issues such as complexity, high costs, low efficiency, and low precision, especially in the difficulty of fabricating nanogrooves with high resolution on the nanoscale. This study proposes a method based on focused ion beam technology and a layer-by-layer etching process, successfully preparing V-shaped and rectangular nanogrooves on a silicon dioxide substrate. Combining with cellular automaton algorithm, the ion sputtering flux and redeposition model was simulated. By converting three-dimensional grooves to discrete rectangular slices through a continuous etching process and utilizing the sputtering and redeposition effects of gallium ion beams, high-aspect-ratio V-shaped grooves with up to 9.6:1 and rectangular grooves with nearly vertical sidewalls were achieved. In addition, the morphology and composition of the V-shaped groove sidewall were analyzed in detail using transmission electron microscopy (TEM) and tomography techniques. The influence of the etching process parameters (ion current, dwell time, scan times, and pixel overlap ratio) on groove size was analyzed, and the optimized process parameters were obtained.

Fabrication of High Precision Self-Aligned V-Grooves Integrated on Silica-on-Silicon Chips

Fabrication of silicon-on-glass waveguides

Ultra-high-Q Microcavities Fabricated on Fused Silica Chips by Three-Dimensional Femtosecond Laser Microfabrication

Simple Technique to Fabricate Microscale and Nanoscale Silicon Waveguide Devices

Design and fabrication of 1 × 32 silica-based arrayed waveguide grating

Fabrication of Si/Si1-Xgex Waveguide Wdm Components

Controllable Fabrication of Gallium Ion Beam on Quartz Nanogrooves

Optimization of nanoscale silicon waveguide fabrication

Fabrication Of Integrated Waveguide Turning Mirror On Silicon-On-Insulator

Fabrication of Optofluidic Systems Using Isotropic Wet Etched Masters in < 111 > Silicon Wafer

A facile nanowire fabrication approach based on edge lithography

Study of Silicon-on-glass Waveguides

Fabrication and Analysis of a Fabry-Perot Cavity with a Micromechanical Wet-Etching Process.

Manufacturing of selectively buried channel waveguide on glass substrate

Low Propagation Loss Ge-on-Si Waveguides and Their Dependency on Processing Methods

High-efficiency Wideband SiNx-on-SOI Grating Coupler with Low Fabrication Complexity.

Fabrication and Characterization of Fine Pitch TSV Integration with Self-Aligned Backside Insulation Layer Opening.

Fabrication and characterization of deeply-etched SiO2 waveguides

Low-Loss V-Groove Coplanar Waveguide On An Soi Substrate

Fabrication of 2D silicon nano-mold by side etch lift-off method

Wafer-scale Fabrication of High-Aspect Ratio Nanochannels Based on Edge-Lithography Technique.