Abstract:Surface acoustic wave (SAW)-based acoustofluidic devices have shown broad applications in microfluidic actuation and particle/cell manipulation. Conventional SAW acoustofluidic device fabrication generally includes photolithography and lift-off processes and thus requires accessing cleanroom facilities and expensive lithography equipment. In this paper, we report a femtosecond laser direct writing mask method for acoustofluidic device preparation. By micromachining of steel foil to form the mask and direct evaporation of metal on the piezoelectric substrate using the mask, the interdigital transducer (IDT) electrodes of the SAW device are generated. The minimum spatial periodicity of the IDT finger is about 200 μm, and the preparation for LiNbO3 and ZnO thin films and flexible PVDF SAW devices is verified. Meanwhile, we have demonstrated various microfluidic functions, including streaming, concentration, pumping, jumping, jetting, nebulization, and particle alignment using the fabricated acoustofluidic (ZnO/Al plate, LiNbO3) devices. Compared to the traditional manufacturing process, the proposed method omits spin coating, drying, lithography, developing, and lift-off processes and thus has advantages of simple, convenient, low cost, and environment friendliness.

Design and Fabrication of Microcantilever Probes Used for Microplasma Maskless Etching

Fabrication of a novel microcantilever probe with inverted pyramidal microdischarge for maskless scanning plasma etching

Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching

Design and fabrication of the microplasma reactor for maskless scanning plasma etching

Femtosecond Laser Micromachining of the Mask for Acoustofluidic Device Preparation

Fabrication and Performance of Microplasma Reactor for Maskless Scanning Plasma Etching

Fabrication of cantilever arrays with nano-aperture hollow tips for parallel microplasma etching

Characterization of inverted pyramidal hollow cathode microplasma devices operating in reactive gases for maskless scanning plasma etching

Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching

Development of microplasma devices arrays for maskless nanoscale material etching

Study of residual stress-induced deformation of multilayer cantilever for maskless microplasma etching

Isotropic Etch for SiO2 Microcantilever Release with ICP System

Discharge properties and AFM imaging experiments of cantilever probe integrated with microplasma reactor

Fabrication and operation of microplasma reactor array for maskless nanoscale material etching

Design and Experiments of Microplasma Reactor for Scanning Plasma Etching

Fabrication of SiO $_{2}$ Microcantilever Using Isotropic Etching With ICP

Fabrication Of Thin-Wall Inverted Pyramid Hollow Tips Array And Nano-Aperture For Maskless Nanoscaled Plasma Patterning

Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching

Simulation and experiments of intrinsic bending of multilayer microcantilever for maskless scanning plasma etching

Fabrication and Performance Optimization of the Microplasma Reactor with Composite Dielectrics

A New Microplasma Reactor for Scanning Plasma Etching