Abstract:Summary form only given. Recent years, a new class of microcavity plasma devices has merged, in which the low temperature, nonequilibrium plasma with unique characteristics, such as weakly-ionized, boundary dominated phenomena and high ion density, was generated in the cavity. Meanwhile there is currently rapid growth of micro plasma application involved environmental ultraviolet radiation sources, plasma reactors, active displays and so on. In this presentation, a Al/Al2O3/Al microplasma device structure with coplanar electrodes fabricated in Al foil and operation in neon is develped. This device is fabricated on a Al foil having thickness in 100μ m by wet chemical processing. The devices have been operated continuously in neon at pressures up to and exceeding one atmosphere. The experiment results for the line array with microcavities having parabolic cross-section dimension of 100×150 mm2 or 150×200 mm2 driven by AC square signal and sinusoidal waveform show that the range of the ignition voltage is approximately 220~300V. In particular, the microplasma device 150 μ m in diameters operated at voltages below 210V at a proper gas pressure produce uniform glow discharge confined in the microcavities and exhibit high radiative efficiency. Furthermore it is evident that the coplanar electrodes microplasma device can be well suited for plasma generating and reactors having potential application in active displays and backlighting as well.

Development of microplasma devices arrays for maskless nanoscale material etching

Fabrication and operation of microplasma reactor array for maskless nanoscale material etching

Design and fabrication of the microplasma reactor for maskless scanning plasma etching

Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching

Characterization of inverted pyramidal hollow cathode microplasma devices operating in reactive gases for maskless scanning plasma etching

Fabrication of a novel microcantilever probe with inverted pyramidal microdischarge for maskless scanning plasma etching

Femtosecond Laser Micromachining of the Mask for Acoustofluidic Device Preparation

Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching

Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching

Fabrication Of Thin-Wall Inverted Pyramid Hollow Tips Array And Nano-Aperture For Maskless Nanoscaled Plasma Patterning

Design and Fabrication of Microcantilever Probes Used for Microplasma Maskless Etching

Fabrication and Performance of Microplasma Reactor for Maskless Scanning Plasma Etching

Study of uniformity of atmospheric pressure plasma microjet array for maskless parallel micropatterned etching

Fabrication of cantilever arrays with nano-aperture hollow tips for parallel microplasma etching

Fabrication and Performance Optimization of the Microplasma Reactor with Composite Dielectrics

Design and Experiments of Microplasma Reactor for Scanning Plasma Etching

A New Microplasma Reactor for Scanning Plasma Etching

PPPS-2013: Fabrication and Electrical Characteristics of Arrays Microplasma Device with Coplanar Electrodes in Al Foil

Equivalent Electrical Model and Experimental Analysis of a Novel Needle-ring Atmospheric Pressure Plasma Microjets Array

Electrical and Optical Testing System for Microplasma in Scanning Plasma Etching

Development of an atmospheric pressure air microplasma jet for the selective etching of parylene-C film