Abstract:Plasmonic nanoscale devices/structures have gained more attention from researchers due to their promising functions and/or applications. One important technical focus on this rapidly growing optical device technology is how to precisely control and fabricate nanostructures for different functions or applications (i.e., patterning end points should locate at/near the interface while fabricating these plasmonic nanostructures), which needs a systematic methodology for nanoscale machining, patterning, and fabrication when using the versatile nanoprecision tool focused ion beam (FIB), that is, the FIB-assisted interface detection for fabricating functional plasmonic nanostructures. Accordingly, in this work, the FIB-assisted interface detection was proposed and then successfully carried out using the sample-absorbed current as the detection signal, and the real-time patterning depth control for plasmonic structure fabrication was achieved via controlling machining time. Besides, quantitative models for the sample-absorbed currents and the ion beam current were also established. In addition, some nanostructures for localized surface plasmon resonance biosensing applications were developed based on the proposed interface detection methodology for FIB nanofabrication of functional plasmonic nanostructures. It was shown that the achieved methodology can be conveniently used for real-time control and precise fabrication of different functional plasmonic nanostructures with different geometries and dimensions.

Fabrication Of Thin-Wall Inverted Pyramid Hollow Tips Array And Nano-Aperture For Maskless Nanoscaled Plasma Patterning

Femtosecond Laser Micromachining of the Mask for Acoustofluidic Device Preparation

Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching

Development of microplasma devices arrays for maskless nanoscale material etching

Optical Device Based on a Nanopillar Array by the Pattern Transfer of an Anodic Aluminum Oxide Membrane

Fabrication of a novel microcantilever probe with inverted pyramidal microdischarge for maskless scanning plasma etching

Fabrication of cantilever arrays with nano-aperture hollow tips for parallel microplasma etching

Fabrication and operation of microplasma reactor array for maskless nanoscale material etching

Design and Fabrication of Microcantilever Probes Used for Microplasma Maskless Etching

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

Design and fabrication of the microplasma reactor for maskless scanning plasma etching

Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching

Fabrication and Performance of Microplasma Reactor for Maskless Scanning Plasma Etching

Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching

Characterization of inverted pyramidal hollow cathode microplasma devices operating in reactive gases for maskless scanning plasma etching

Fabrication and Performance Optimization of the Microplasma Reactor with Composite Dielectrics

Study of uniformity of atmospheric pressure plasma microjet array for maskless parallel micropatterned etching

Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures

Rapid Focused Ion Beam Milling Based Fabrication of Plasmonic Nanoparticles and Assemblies Via "sketch and Peel" Strategy.

General Fabrication of Ordered Nanocone Arrays by One-Step Selective Plasma Etching

Plasma-assisted Filling Electron Beam Lithography for High Throughput Patterning of Large Area Closed Polygon Nanostructures