Abstract:A novel atmospheric pressure plasma microjet (APPμJ) array is proposed to realize maskless parallel micropatterned etching of materials. Due to applying microfabrication technology, the dimension and distance of multiple jets in an array can be adjusted at a micro/nanoscale. However, interactions among multiple jets often lead to inconsistency of microjets and nonuniformity of sample etching. In this study, a 1 × 2 APPμJ array with 90‐μm nozzles and varying jet‐to‐jet distance is developed. The effects of different operating factors on the consistency of the APPμJ array are investigated. The experiment results show that the consistency of the microjet array and uniformity of sample etching can be greatly improved by optimizing operating parameters, such as applied voltage, gas flow rate, and jet‐to‐jet distance. A novel atmospheric pressure plasma microjet array, which consists of an atmospheric pressure plasma jet and a microfabricated silicon micronozzle array is proposed for maskless parallel micropatterned etching. Due to the interaction of multiple jets, the microjet array exhibits inconsistency, which affects the uniformity of sample etching. By optimization operating parameters, such as applied voltage, gas flow rate, and jet‐to‐jet distance, the consistency of microjet array and uniformity of sample etching can be greatly improved.

Design and fabrication of the microplasma reactor for maskless scanning plasma etching

Fabrication and Performance of Microplasma Reactor for Maskless Scanning Plasma Etching

Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching

Fabrication and operation of microplasma reactor array for maskless nanoscale material etching

Fabrication of a novel microcantilever probe with inverted pyramidal microdischarge for maskless scanning plasma etching

Characterization of inverted pyramidal hollow cathode microplasma devices operating in reactive gases for maskless scanning plasma etching

Fabrication and Performance Optimization of the Microplasma Reactor with Composite Dielectrics

Development of microplasma devices arrays for maskless nanoscale material etching

Design and Fabrication of Microcantilever Probes Used for Microplasma Maskless Etching

Design and Experiments of Microplasma Reactor for Scanning Plasma Etching

A New Microplasma Reactor for Scanning Plasma Etching

Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching

Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching

Fabrication Of Thin-Wall Inverted Pyramid Hollow Tips Array And Nano-Aperture For Maskless Nanoscaled Plasma Patterning

Diagnostic of Microplasma Reactor for Scanning Plasma Etching

Electrical and Optical Testing System for Microplasma in Scanning Plasma Etching

Study of residual stress-induced deformation of multilayer cantilever for maskless microplasma etching

Simultaneous Diagnostics of Electron Density and Temperature in Micoplasma Reactor for Scanning Plasma Etching

Study of uniformity of atmospheric pressure plasma microjet array for maskless parallel micropatterned etching

SF6 plasma etching and profile evolution of silicon in microplasma reactor

Simulation and experiments of intrinsic bending of multilayer microcantilever for maskless scanning plasma etching