Abstract:Well-shaped micro/nano-structured suspended graphene is a versatile building block for micro/nano-electromechanical (MEMS/NEMS) devices. Directly 'sculpting' the suspended graphene membrane using an accelerated energetic electron/ion beam to form micro/nano-structured graphene possesses the merits of high resolution and well-processed flexibility. However, both the residual and process-induced stress in the membrane still challenge the obtaining of non-distorted freestanding graphene patterns. We report a featured double-sided masking and stress-release etching method to fabricate well-defined suspended graphene micro-ribbon. We demonstrated that the one-step low-energy (10 keV) electron beam induced the deposition of amorphous carbon (a-C) on both sides of the suspended graphene. The a-C layers were precisely self-aligned, not only allowing its use as reliable masks for the following plasma etch of suspended graphene, but showing potential for future applications of effectively 'writing' circuits/devices directly on both sides of a suspended 2D atomic-layered platform. A stress-release plasma etching process and its 'self-crumpling' mechanism were demonstrated. High-aspect-ratio micro-structured graphene (bridge and cantilever) with a good shape was obtained. This provides a promising and universal processing method for making suspended structures of 2D materials with in-plane flatness for potential MEMS/NEMS applications.

Study of residual stress-induced deformation of multilayer cantilever for maskless microplasma etching

Study of Local Stress Using Stress-Absorbing Si Diaphragm

Tuning the shape and curvature of micromachined cantilevers using multiple plasma treatments

Control the shape and curvature of micromachined cantilever using multiple plasma chemistry bonding technology

Design of Piezoresistive Micro-Cantilever with Stress Concentration Regions

Stress-Etching Using Laser Electrochemical Micromachining with Masks

A Novel Approach to Study Patterned Thin Film Local Stress for Microelectronics Application

Double-sided Masking and Stress-Release Etching for the Fabrication of High-Aspect-ratio Graphene Micro-Cantilever

New avenues for residual stress analysis in ultrathin atomic layer deposited free-standing membranes through release of micro-cantilevers

Study for Laser Controlled Fabrication of Micro/Nano-Structures of Silicon Based on Multi-Physics Model

Experiments on the Deformation of MEMS Mciro-Cantilever Using AFM

Study on maskless etching of silicon symmetric beam-mass structure in aqueous KOH

Micro-mechanical Characterisation for MEMS Thin Films by Bending Μ-Machined Cantilevers

Fabrication and Application of a Novel Freestanding Stencil Bi-Material Cantilever Structure

Fabrication and Analysis of Micromachined Cantilever Array

Experimental and modeling study of controllable laser lift-off via low-fluence multiscanning of polyimide-substrate interface

Ultra-sensitive, Highly Reproducible Film Stress Characterization Using Flexible Suspended Thin Silicon Plates and Local Curvature Measurements

(Digital Presentation) Uniformity and Profile Improvement of Fin Etching Process at Wafer Extreme Edge for Finfet Mass Production

Maskless Etching Of Three-Dimensional Silicon Structures In Koh

Fabrication and Characterization of Piezoelectric Cantilever for Micro Transducers

Stress-assistant selective etching mechanism for lithography-independent nanofabrication