Abstract:Microplasmas are used for technology applications, electron microscopy for micro‐ to nanoscale analyses. Combining them gives new insights into plasma‐sample interactions. This work presents a microplasma setup in a scanning electron microscope. Real‐time imaging during plasma operation and its effect on the sample are shown. This provides new capabilities for plasma and materials science, for example, modification on the micrometer scale. Microplasmas can be used for a wide range of technological applications and to improve the understanding of fundamental physics. Scanning electron microscopy, on the other hand, provides insights into the sample morphology and chemistry of materials from the mm‐ down to the nm‐scale. Combining both would provide direct insight into plasma‐sample interactions in real‐time and at high spatial resolution. Up till now, very few attempts in this direction have been made, and significant challenges remain. This work presents a stable direct current glow discharge microplasma setup built inside a scanning electron microscope. The experimental setup is capable of real‐time in situ imaging of the sample evolution during plasma operation and it demonstrates localized sputtering and sample oxidation. Further, the experimental parameters such as varying gas mixtures, electrode polarity, and field strength are explored and experimental V–I curves under various conditions are provided. These results demonstrate the capabilities of this setup in potential investigations of plasma physics, plasma‐surface interactions, and materials science and its practical applications. The presented setup shows the potential to have several technological applications, for example, to locally modify the sample surface (e.g., local oxidation and ion implantation for nanotechnology applications) on the μm‐scale.

Design and Experiments of Microplasma Reactor for Scanning Plasma Etching

A New Microplasma Reactor for Scanning Plasma Etching

Fabrication and Performance of Microplasma Reactor for Maskless Scanning Plasma Etching

Design and fabrication of the microplasma reactor for maskless scanning plasma etching

Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching

Diagnostic of Microplasma Reactor for Scanning Plasma Etching

Characterization of inverted pyramidal hollow cathode microplasma devices operating in reactive gases for maskless scanning plasma etching

Electrical and Optical Testing System for Microplasma in Scanning Plasma Etching

Etching Mechanism of Microplasma Reactor for Scanning Plasma Etching

Simultaneous Diagnostics of Electron Density and Temperature in Micoplasma Reactor for Scanning Plasma Etching

SF6 plasma etching and profile evolution of silicon in microplasma reactor

Design and Fabrication of Microcantilever Probes Used for Microplasma Maskless Etching

Fabrication of a novel microcantilever probe with inverted pyramidal microdischarge for maskless scanning plasma etching

Fabrication and Performance Optimization of the Microplasma Reactor with Composite Dielectrics

Development of microplasma devices arrays for maskless nanoscale material etching

Fabrication and operation of microplasma reactor array for maskless nanoscale material etching

Research of Extraction Mechanism for Microplasma Reactor

Development and Optimization of Step-A Linear Plasma Device for Plasma-Material Interaction Studies

Discharge properties and AFM imaging experiments of cantilever probe integrated with microplasma reactor

In Situ Plasma Studies Using a Direct Current Microplasma in a Scanning Electron Microscope

A study on the etching characteristics of atmospheric pressure plasma for single-crystal silicon wafer