Abstract:Silicon carbide (SiC), a non-oxide ceramic with superior thermo-mechanical stability, chemical and radiation resistive properties, finds extensive utilization in optical instruments for terrestrial and space applications. However, its inherent porous texture (α-HCP) becomes a deterrent for high-performance optical telescopes, although several techniques of surface alterations over sintered or reaction-bonded SiC are available. In the present work, the physical vapour deposition (PVD) technique is adopted to deposit a thick (∼5 μm) Silicon dioxide (SiO2) clad layer on a sintered and optically polished SiC (SSiC) substrate. SiO2 clad layer coated SSiC (SDO-SSiC) substrate reduces the surface porosity of SSiC which is found to be suitable for optical mirror application. Finally, an Al based reflective and oxides protective coatings are deposited on SiO2 clad layer to achieve reflective behaviour. The surface figure of 75 nm PV (peak-to-valley) and less than 2 nm surface micro-roughness values are achieved which meets the stringent optical telescope specifications for terrestrial and space applications. The structural and nano-mechanical properties of presently developed SiO2 clad layer-based SiC telescopic mirror have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-Ray Analysis (EDX), atomic force microscopy (AFM), and nanoindentation techniques. The optical properties are investigated by optical profilometry and wavelength based spectrometric (both in visible and infrared ranges) techniques. Finally, space worthiness studies viz., thermo-vacuum, thermal storage, thermal shock and relative humidity tests have been carried out successfully. The process of cleaning, grinding and polishing at each substrate preparation stage and coatings are also reported comprehensively.

Characterization of Silicon Carbide Films Prepared by Chemical Vapor Deposition

Characterization of Silicon Carbide Grown on Rb-Sic by Chemical Vapor Deposition

Influence of SiC Coating Thickness on Mechanical Properties of SiCf/SiC Composite

Silicon Carbide Composites Deposited in Silicon Carbide Whiskers by Cvi Process

Growth and Mechanical Properties of Amorphous and Nanostructured SiC films

Influence of C_2H_4 on the Properties of Amorphous Silicon Film Grown by Chemical Vapor Deposition

Development and characterization of silicon dioxide clad silicon carbide optics for terrestrial and space applications

PREPARATION OF SiC-B4C COMPOSITE FILM AND ITS MECHANICAL AND THERMOELECTRIC PROPERTIES

Synthesis of silicon carbide films by combined implantation with sputtering techniques

Chemical Vapor Deposition and Defect Characterization of Silicon Carbide Epitaxial Films

Characterization of polycrystalline silicon carbide films grown by atmospheric pressure chemical vapor deposition on polycrystalline silicon

Preparation of Silicon Carbide Nanowires and Nanochains Using Chemical Vapor Deposition Method

The structure of chemical vapor deposited silicon carbide

Conformal and Stoichiometric Chemical Vapor Deposition of Silicon Carbide onto Ultradeep Heterogeneous Micropores by Controlling the Initial Nucleation Stage

Preparation And Characterization Of Silicon Carbide Thin Films Synthesized By Rf-Reactive Sputtering

Preparation of Si–C–H thin films embedded with high oriented (100) polycrystalline silicon

Measurement and Analysis on the Mechanical Properties of Silicon Carbide Film

Thermal Stress and Displacement in Process of Producing CVD-SiC Mirror

Cubic SiC nano-thin films and nano-wires: high vacuum metal-organic chemical vapor deposition, surface characterization, and application tests

Microstructure Evolution and Performance Improvement of Silicon Carbide Ceramics via Impregnation Method

Deposition Of Nanocrystalline Cubic Silicon Carbide Films Using The Hot-Filament Chemical-Vapor-Deposition Method