Design and Fabrication of DC to 30 GHz DC-contact Shunt RF MEMS Switch

侯智昊,刘泽文,李志坚
DOI: https://doi.org/10.3321/j.issn:1004-924x.2009.08.022
2009-01-01
Optics and Precision Engineering
Abstract:The design and fabrication processes of a DC-contact shunt RF MEMS switch were studied to improve its performance. A low stress electroplated Au membrane was taken as an upper electrode to implement the Au-Au direct contact. BorofloatTM glass was used as a substrate and a inside resistance was used to isolate the crosstalk between radio-frequency signal and bias voltage. Then,the distance between Au membrane and Coplanar Waveguide(CPW) was optimized to lower the insertion losses of the switch. Experimental results show that the contact resistance is 0.1 Ω under the pull-down voltage of 60 V. The insertion losses are -0.03 dB@1GH,-0.13 dB@10 GHz,-0.19 dB@20 GHz in the frequency ranges from DC to 30 GHz,which is less than -0.5 dB;the isolations are -47dB@1 GHz,-30 dB@10 GHz and -25 dB@20 GHz in the same frequency ranges,which is all better than -23 dB. The measurement results show that the fabricated RF MEMS switch is suitable for the applications of frequency ranges from DC to 30 GHz.
What problem does this paper attempt to address?