Laser-Induced Damage Threshold At Different Wavelengths Of Ta2o5 Films Of Wide-Range Temperature Annealing

Cheng Xu,Yinghuai Qiang,Yabo Zhu,Jianda Shao,Zhengxiu Fan
2009-01-01
Journal of optoelectronics and advanced materials
Abstract:The laser-induced damage of Ta2O5 films annealed at wide-range temperature (473-1273 K) at the laser wavelengths of 1064 nm and 355 nm was investigated. The relations among microstructure, optical properties, absorption, chemical composition and laser-induced damage threshold (LIDT) at different wavelengths were researched. The dependence of damage mechanism on laser wavelength was discussed. It was found that both the LIDT increases firstly and then decreases with the increase of annealing temperature either at 1064 nm or 355 nm. The LIDT at 1064 nm was influenced mainly by the substoichiometric defect, structural defect and thermal diffusion, whereas at 355 nm it was influenced more significantly by the intrinsic absorption and structural defect, Both the maximum LIDT at the two wavelengths was achieved at the annealing temperature of 873 K, which could be attributed to the lowest defect density in the films.
What problem does this paper attempt to address?