Laser Annealing of Amorphous Ni-Ti Shape Memory Alloy Thin Films

Xi Wang,Zhenyu Xue,Joost J. Vlassak,Yves Bellouard
DOI: https://doi.org/10.1361/cp2006smst331
2008-01-01
Abstract:and composition, the substrates were rotated at a speed of 20 RPM. The composition of the films was measured to be 50.5 ± 0.2 at. %Ti by means of electron microprobe analysis (EMPA). The as- deposited films were amorphous as confirmed by X-ray diffraction. In the laser annealing process, samples were annealed by scanning a laser beam over the surface of the films. A fiber-injected CW near-IR laser diode (coherent/925nm) was used to obtain the results presented in this study. The laser beam had a Gaussian power distribution and a diameter of approximately 0.9mm. The specimen was mounted on a platform capable of planar translational and rotational motions with micron resolution. In the experiment, the laser power was varied from 5 to 9.4 W; the scan speed was varied from 1 to 8 mm/s. All scans were performed in air in a thermally stabilized environment. During laser annealing a thin oxide layer was formed on top of the NiTi film. As we will show later in this paper, this oxide plays an important role in the laser annealing process.
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