Preparation and Annealing of Sputtered NiTi Shape Memory Thin Films

宫峰飞,王业宁,沈惠敏
DOI: https://doi.org/10.3969/j.issn.1009-6264.2001.04.010
2001-01-01
Abstract:The amorphous NiTi thin films fabricated by magnetron sputtering demonstrate no shape memory effect. The shape memory effect after different annealing conditions was studied. The optimum annealing condition was in the temperature range of 500℃ to 700℃ for 0.5h.
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