The Behavior of Crystalline Grain Growth in TiNi Shape Memory Alloy Thin Films

MENG Fan-ling,LI Yong-hua,LIU Chang-sheng,XU Yue,WANG Yu-ming
DOI: https://doi.org/10.3321/j.issn:1671-5489.2008.03.034
2008-01-01
Abstract:NiTi thin films were deposited on glass substrate by d.c.magnetron sputtering.X-ray diffraction(XRD) and small-angle X-ray scattering(SAXS) were used to study the behavior of crystalline grain growth in TiNi alloy thin films annealed at 500 ℃.The thin films were deposited at room temperature.
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