Influence of annealing on microstructure and electrochromic properties of WO3 thin film

Feng Rao,Gaorong Han
2004-01-01
Abstract:WO3 films, grown by electron beam evaporation on indium tin oxide (ITO) coated glass substrates, were annealed at a temperature ranging from 250°C to 550°C, for different time intervals of 1-4 hours in air. Its microstructures were characterized with X-ray diffraction (XRD). The results show that annealing strongly affects the crystallinity and electrochromic properties of the WO3 films. Possible mechanisms were also tentatively discussed.
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