Effects of Post Annealing Atmosphere on Electrical and Optical Properties of SnO2:F Thin Films

李铭,高倩,刘涌,宋晨路,韩高荣
DOI: https://doi.org/10.14136/j.cnki.issn1673-2812.2012.01.004
2012-01-01
Abstract:The SnO2:F thin films with low-emission property have been widely used as a dominating energy saving glass.Effect of post annealing treatment on the low-emission has attracted attention for both academic research and practical applications worldwide.In this work,different annealing approaches were carried out on the as-deposited SnO2:F(~250nm,with ~20nm SiO2 barrier on glass substrate) glass.It was found that the structural,compositional,electrical,and optical characteristics were significantly influenced by annealing atmosphere,under air or nitrogen.By calculating the lattice parameters and volume data of the unit cells for SnO2:F thin films,a reasonable explanation of the decrease in low-e property was proposed.
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