Annealing effects on properties of antimony tin oxide thin films deposited by RF reactive magnetron sputtering

Jow-Lay Huang,Yi Pan,Jia Yuan Chang,Bao-Shun Yau
DOI: https://doi.org/10.1016/j.surfcoat.2003.11.004
IF: 4.865
2004-01-01
Surface and Coatings Technology
Abstract:Antimony tin oxide (ATO) films were sputtered on glass substrates using RF reactive magnetron sputtering at a power of 100 W, a substrate temperature of 300 °C and an oxygen flow rate ranging from 7 to 20 sccm. The films were annealed for 1 h in oxygen and nitrogen atmospheres at temperatures of 300, 400 and 500 °C. Annealing effect was studied by comparing the electrical and optical properties of the annealed and unannealed films.
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