Effect of Post-Annealing Treatments on the Properties of Zn1−xCdxO Films on Glass Substrates

DW Ma,ZZ Ye,JY Huang,LP Zhu,BH Zhao,JH He

DOI: https://doi.org/10.1016/j.mseb.2003.12.007

2004-01-01

Abstract:Ternary Zn1−xCdxO (0≤x≤0.53) alloy crystalline films with highly (002)-preferred orientations have been prepared on glass substrates by using the dc reactive magnetron sputtering method and exposed to annealing treatments in O2 ambient. The crystal quality of the annealed Zn1−xCdxO films improves much. As a case of the sample with x=0.53, the diffraction peaks in intensity attain maximum values at the annealing temperature of 500°C. But for the samples with x≥0.53, the CdO phase separation and re-evaporation from the films are very serious. So for the Zn1−xCdxO films with higher Cd content, to prevent the segregation of CdO, the annealing temperature should be less than 400°C, and the annealing time should be less than 1h.