Abstract:The field of ultraviolet (UV)-laser applications is currently experiencing rapid growth in the semiconductor processing, laser micromachining and biomedical markets. Key enablers for these technologies are optical coatings used to manipulate and guide laser beams in a targeted manner. As laser power, laser fluence and pulse frequencies increase, the demands on the physical properties of the coating materials become more stringent. Ion beam sputtering is a technique that allows producing optical coatings with the low losses required in these applications. In this study, we investigate the influence of ion beam sputtering (IBS) parameters on the optical properties of HfO2 and SiO2 single layers as well as the impact of annealing duration at 475 °C for anti-reflective (AR) and highly reflective (HR) optical coatings at 355 nm. For HfO2 sputtered from a metal target the O2 flow during the coating process is a key parameter to reduce absorption. SiO2 single layers exhibit improved transmission in the UV-range as the ion beam energy for the sputtering process is reduced. Furthermore, a complex behavior for film stress, absorption, surface roughness and coating structure was unraveled as a function of annealing duration for AR- and HR-coatings at 355 nm. The reflectance of the HR-mirror after optimized annealing exceeded 99.94% at 355 nm and a high laser induced damage threshold (LIDT) of 6.9 J/cm2 was measured after 2 hours of annealing. For the AR-coating a LIDT-value of 15.7 J/cm2 was observed after 12 hours of annealing.

Mechanism of annealing effect on damage threshold enhancement of HfO2 films in vacuum

Annealing Temperature Dependence on the Structural and Optical Properties of Sputtering-Grown High-K HfO2 Gate Dielectrics

Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films

Modulation of Interfacial and Electrical Properties of ALD-derived HfAlO/Al2O3/Si Gate Stack by Annealing Temperature

Effect of annealing on the properties of plasma-enhanced atomic layer deposition grown HfO 2 coatings for ultraviolet laser applications

Investigation on the Laser-induced Damage Morphology of HfO2/SiO2 Antireflection Films

Effects of annealing parameters on transmission wavefront and damage threshold of fused silica

Contaminant-free Layer-by-layer Annealing to Improve the Properties of HfO2/SiO2 Optical Films for the Fs Laser

Annealing behaviors of structural, interfacial and optical properties of HfO 2 thin films prepared by plasma assisted reactive pulsed laser deposition

Effect of Heat Treatment on Properties of HfO2 Film Deposited by Ion-Beam Sputtering

Laser-induced Damage Threshold of Hafnia Thin Films with Chemical Method

Mechanism for Atmosphere Dependence of Laser Damage Morphology in HfO2/SiO2 High Reflective Films

Effect of annealing on the properties of HfO2-Al2O3 mixture coatings for picosecond laser applications

Annealing Effects on Microstructure and Laser-Induced Damage Threshold of Quasi-Rugate Filters.

The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films

Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si (100)

Air Annealing Effect on Oxygen Vacancy Defects in Al-doped ZnO Films Grown by High-Speed Atmospheric Atomic Layer Deposition

Post-Annealing Treatments and Interface Effects on Anomalous Magnetic Characteristics of HfOx Film

Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition

Influence mechanism of laser conditioning on the microcosmic properties of HfO2 optical thin films

Effect of annealing on properties and performance of HfO2/SiO2 optical coatings for UV-applications