An innovative method for preparation of sol–gel HfO2 films with high laser-induced damage threshold after high-temperature annealing

Miao Zhang,Yongqiao Zhu,Dawei Li,Peizhong Feng,Cheng Xu
DOI: https://doi.org/10.1016/j.apsusc.2021.149615
IF: 6.7
2021-07-01
Applied Surface Science
Abstract:<p>In this study, HfO<sub>2</sub> films were prepared using the sol-gel method with HfCl<sub>4</sub> as a precursor, HNO<sub>3</sub> as a hydrolysis inhibitor and polyethylene glycol as an additive. Investigations were then made into the properties and laser damage characteristics of the films after annealing at different temperatures. The prepared films have high transmittance, low absorption and high laser-induced damage threshold (LIDT). Specifically, the LIDT of the film was as high as 31.6 J/cm<sup>2</sup> after annealing at 353 K, and it gradually dropped to 21.7 J/cm<sup>2</sup> after annealing at 573 K, indicating its strong resistance to high temperature. This study reported a novel method for preparing sol-gel HfO<sub>2</sub> films with high LIDT and pinpointed the potential application of the films under high-temperature conditions.</p>
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
What problem does this paper attempt to address?
The problems that this paper attempts to solve are: How to prepare HfO₂ thin films with a high laser - induced damage threshold (LIDT) by the sol - gel method, and study their performance and stability under high - temperature annealing conditions. Specifically, the objectives of the paper include the following aspects: 1. **Develop an innovative method**: - Use HfCl₄ as a precursor, HNO₃ as a hydrolysis inhibitor, and polyethylene glycol (PEG) as an additive to prepare HfO₂ thin films by the sol - gel method. - This method aims to overcome the limitations of traditional physical deposition methods while increasing the LIDT of the thin films. 2. **Study the influence of high - temperature annealing on the properties of the thin films**: - Explore the effects of different annealing temperatures (353 K, 423 K, 503 K, and 573 K) on the optical characteristics, microstructure, absorptivity, surface morphology, LIDT, and damage morphology of HfO₂ thin films. - Pay special attention to the stability and anti - laser - damage ability of the thin films under high - temperature conditions. 3. **Enhance the application potential of the thin films in high - temperature environments**: - Research shows that using inorganic metal halides (such as HfCl₄) as precursors and high - boiling - point PEG as additives can effectively reduce the content of organic substances and decrease the defects caused by the evaporation of organic matter during high - temperature annealing. - This enables the prepared HfO₂ thin films to maintain a high LIDT even under high - temperature conditions. ### Core problems of the paper The core problem of the paper is: How to prepare HfO₂ thin films that still have a high laser - induced damage threshold in high - temperature environments by optimizing the sol - gel preparation process. This not only involves the improvement of material preparation techniques but also the study of the structural stability and anti - laser - damage ability of the thin films under high - temperature conditions. Through the above research, the paper provides new possibilities for the application of HfO₂ thin films in high - power laser systems, especially in practical application scenarios in high - temperature environments.