Abstract:The influence of coating thickness on laser-induced damage (LID) characteristics of anti-reflection (AR) coatings irradiated by 1064 nm nanosecond laser pulses was investigated. Two HfO2/SiO2 AR coatings with different physical thicknesses, 0.7 and 2.7 mu m, were prepared and tested. To study the effect of coating thickness on a laser-induced damage threshold (LIDT) in isolation, electric field intensities (EFIs) at the substrate-coating interface were kept the same by using proper AR designs. Moreover, 2 nm artificial gold particles with a density of 10 mm(-2) were implanted into the substrate-coating interface to achieve reliable experimental results. An optical microscope (OM) and a scanning electron microscope (SEM) were used for an online LIDT test and offline LID morphology observation, respectively. The typical LID morphology of thicker AR coatings was flat bottom craters with diameters of 20-50 mu m, which can be easily observed by an online OM. For thinner AR coatings, hemispherical craters with diameters down to 1 mu m were found as typical LID morphology by a SEM. However, these tiny craters could not be observed by an online OM. Moreover, such tiny craters did not grow with subsequent pulses, so they did not degrade the functional laser damage resistance of the thin AR coatings. When identified with an online OM, the LIDT of thinner AR coatings is found to be about two times higher than the thicker ones, and large delamination was mainly found as the LID morphology of AR coatings with high fluence. When observed with a SEM, the LIDT of thin AR coatings with tiny craters was over 60% lower than the LIDT of thick AR coatings, which agrees with the model that less energy is required to form smaller LID craters of thinner coatings. (C) 2017 Optical Society of America

Study of Laser-Irradiated Thin Films

Researches on Laser Damage Resistance of Optical Films

Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

Femtosecond Laser-Induced Damage and Ultrafast Dynamics in Highs Reflection Coating

A New Definition of Laser Damage Threshold of Optical Thin Films: Optical Breakdown Threshold

Comparative studies of laser-induced damage of several single-layer optical films

Contrast Study of Laser-induced Damage of Monolayer SiO2 and ZrO2 Films

Studies on Micro-Structure of Nano-ZrO2 Films

Femtosecond Laser Pulse Induced Damage In Thin Films - Art. No. 60281d

Influence of Subsurface Defects on 355 Nm Laser Damage Resistance of Monolayer and Multilayer Coatings

Experimental research of laser-induced damage of the monolayer ZrO2 PVD and sol–gel films

Damage Performance of TiO2/SiO2 Thin Film Components Induced by a Long-Pulsed Laser

Laser-induced damage mechanism of the sol–gel single-layer SiO2 acid and base thin films

Influence of Coating Thickness on Laser-Induced Damage Characteristics of Anti-Reflection Coatings Irradiated by 1064 Nm Nanosecond Laser Pulses

Study on Laser Damage Properties of Thin Films

Analysis of optical and damage properties for several ultraviolet thin film materials

Laser Induced Damage of Optical Elements–a Status Report

Laser damage mechanisms of a variable refractivity thin film consists of non-quarter-wavelength film layers

Control of the damage threshold of Si via a SiO2 coating upon irradiation with Mid-IR femtosecond laser pulses

Laser Damage Performance Study of Fundamental Frequency Dielectric Film Optical Elements

Study of micron-scale defects in optical coatings for high-power lasers deposited by ion beam sputtering