Ba0.6Sr0.4TiO3 Thin Films Used As Gate Dielectric in Pentacene Transistors

Guifang Dong,Yuexiang Lu,Yong Qiu
DOI: https://doi.org/10.1149/1.2980565
2008-01-01
Abstract:Ba0.6Sr0.4TiO3 thin films have been prepared via sol-gel process and the effect of process temperature on the characteristics of the thin film has also been investigated. It was found that when the pre-treatment and the annealing temperatures were at 350 Celsius degree, a dielectric constant of more than 10 and the leakage current density of 3.5×10^(-8) A/cm^2 at an electric field of 0.3 MV/cm were observed. Using the Ba0.6Sr0.4TiO3 thin film as the gate dielectric, pentacene thin-film transistors were prepared with the current on/off ratio of 1.4x10^4 and the mobility of 0.18 cm^2/V s.
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