Pentacene Thin-Film Transistors with Sol-Gel Derived Amorphous Ba0.6Sr0.4TiO3 Gate Dielectric

Wei Wang,Guifang Dong,Liduo Wang,Yong Qiu
DOI: https://doi.org/10.1016/j.mee.2007.07.016
IF: 2.3
2008-01-01
Microelectronic Engineering
Abstract:An amorphous Ba"0"."6Sr"0"."4TiO"3 (BST) film with the thickness of 200nm was deposited on indium-tin-oxide (ITO)-coated glass substrate through sol-gel route and post-annealing at 500^oC. The dielectric constant of the BST film was determined to be 20.6 at 100kHz by measuring the Ag/BST/ITO parallel plate capacitor, and no dielectric tunability was observed with the bias voltage varying from -5 to 5V. The BST film shows a dense and uniform microstructure as well as a smooth surface with the root-mean-square (RMS) roughness of about 1.4nm. The leakage current density was found to be 3.5x10^-^8A/cm^2 at an applied voltage of -5V. The transmittance of the BST/ITO/glass structure is more than 70% in the visible region. Pentacene based transistor using the as-prepared BST film as gate insulator exhibits a low threshold voltage of -1.3V, the saturation field-effect mobility of 0.68cm^2/Vs, and the current on/off ratio of 3.6x10^5. The results indicate that the sol-gel derived BST film is a promising high-k gate dielectric for large-area transparent organic transistor arrays on glass substrate.
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