Phase Evolution In The Phosphorous-Rich Layer Formation For Snagcu/Ni-P Join

Y. C. Lin,K. J. Wand,J. G. Duh
DOI: https://doi.org/10.1109/ICSICT.2006.306468
2006-01-01
Abstract:High writing current is the bottle-neck of PCM application and efforts focus on merely materials doping to improve crystal resistivity, novel structure to decrease active area etc. Here some solutions of our group are shown, including Si doped GST, novel 2D and 3D memory cell structure and multi-state storage. © 2006 IEEE.
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