Phase Evalution in the Phosphorous-rich Layer Formation for SnAgCu/Ni-P Join

Lin, Y.C.,Wang, K.J.,Duh, J.G.
DOI: https://doi.org/10.1109/EMAP.2006.4430658
2006-01-01
Abstract:In microelectronic package, interfacial reaction between solders and under bump metallizations (UBM) is very important in the joint reliability. In this study, interfacial morphologies and microstructure of Sn-3Ag-0.5Cu/Ni-P UBM with various phosphorous contents were investigated by field emission electron probe microanalyzer (FE-EPMA). Through contrast control technique in the BEI mode along with series of quantitative analysis phase evolution of P-rich layers was investigated. In addition, a possible formation mechanism of Ni2SnP layer was proposed.
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