EFFECTS OF SPUTTERING POWER ON COMPOSITION AND MICROSTRUCTURES OF PRECURSOR FILMS FOR ABSORBER OF CIAS SOLAR CELL

Hua Xiang,Daming Zhuang,Gong Zhang,Chunlei Li
DOI: https://doi.org/10.3321/j.issn:0254-0096.2007.05.008
2007-01-01
Abstract:CuIn, CuAl and CuInAl (CIA) precursor films were prepared using middle frequency magnetron sputtering. SEM and XRD were used to observe and analyze the surface morphologies, compositions, and microstructures of the various films. The effects of sputtering power on compositions and microstructures of films were analyzed intensively. The results showed that the atomic ratios of Cu, In and Al in the films can be controlled accurately by adjusting the sputtering power. The CIA precursor films with a Cu/(In + Al) atomic ratio of approaching 1 and an adjustable Al/(In + Al) ratio and with uniform distribution of all alloys were obtained. CIA precursor film is composed of CuIn phase and In phrase. Al exists mainly in solid solution by substituting In. Ideal CIA precursor film consists of both Cu11In9, and CuIn phases which were obtained under the sputtering power of 0.20 and 0.15 W/cm2 for CuIn and CuAl targets, respectively.
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