Abstract:Despite the continued scaling down of semiconductor manufacturing, traditional lithography-based nanofabrication only produces thin film structures, not 3-D shapes. 3-D nanofabrication remains a major challenge, especially for semiconductor materials. Most 3-D nanofabrication techniques, such as two-photon printing and stereolithography, mostly work for polymer materials, not solid-state semiconductor materials. Here, a method capable of fabricating sophisticated 3-D nanostructures of silicon based on the subsurface swelling phenomenon using focused helium ion swelling is reported. Silicon nanosphere arrays, hierarchical nanospheres mimicking compound lenses, nano-Taichi symbols, three-layer nanotowers, and nanopumpkins have been demonstrated, which are challenging for existing nanofabrication technology. The produced silicon nanostructures exhibit super small surface roughness as small as 0.1 nm, two orders of magnitude better than existing 3-D nanofabrication technologies normally above 10 nm. The super small surface roughness opens doors for many exciting applications in photonics, indicating small photon losses. Moreover, it is demonstrated ultraprecise fine-tuning of critical dimensions of ready-made nanostructures or nanodevices, such as tuning the tilting angle of the tip on the atomic force microscopy probe and reducing the nanogap between two metal electrodes from 200 to 4 nm, which is promising for improving nanodevice performances by tuning the critical dimensions to desired ranges.

Fabricating Artificial Nanowells with Tunable Size and Shape by Using Scanning Tunneling Microscopy

Fabricating Artificial Nanostructures with a Scanning Tunneling Microscope

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Fabrication of Silicon Nanowire Arrays with Controlled Diameter, Length, and Density

Nanostructure fabrication on silicon surfaces by atom transfer from a gold tip using an ultrahigh vacuum scanning tunneling microscope

Engineering Island-Chain Silicon Nanowires Via a Droplet Mediated Plateau-Rayleigh Transformation

Tiny silicon nano-wires synthesis on silicon wafers

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation

Fabrication of Silicon Nanopores with Tunable Shapes and Sizes

Direct Fabrication of Sub-10 nm Nanopores in WO 3 Nanosheets Using Single Swift Heavy Ions

Nanostructure Fabrication with a Point Contact Formation Between a Gold Tip and a Si(111)-(7×7) Surface with an Ultrahigh Vacuum Scanning Tunneling Microscope

Fabrication of Hourglass-Shaped Solid-State Nanopores

Controlled Fabrication of Hierarchically Branched Nanopores, Nanotubes, and Nanowires.

Shape-controlled fabrication of micro/nanoscale triangle, square, wire-like, and hexagon pits on silicon substrates induced by anisotropic diffusion and silicide sublimation.

P1&#x2013;17: Controlled Synthesis of Au and Ag/Au Nanoparticles for Fabrication of N-Doped Amorphous Si Nanowire Field Emission Cathode

Tailoring Two-Dimensional Nanoparticle Arrays into Various Patterns

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation (Adv. Mater. Interfaces 10/2022)

One-step Ion Beam Irradiation Manufacture of 3D Micro/nanopatterned Structures in SiC with Tunable Work Functions

Integration of Tunable Two-Dimensional Nanostructures on a Chip by an Improved Nanosphere Lithography Method