Abstract:Controlled and uniform assembly of "bottom-up" nanowire (NW) materials with high scalability has been one of the significant bottleneck challenges facing the potential integration of nanowires for both nano and macro electronic circuit applications. Many efforts have focused on tackling this challenge, and while significant progress has been made, still most presented approaches lack either the desired controllability in the positioning of nanowires or the needed uniformity over large scales. Here, we demonstrate wafer-scale assembly of highly ordered, dense, and regular arrays of NWs with high uniformity and reproducibility through a simple contact printing process. We demonstrate contact printing as a versatile strategy for direct transfer and controlled positioning of various NW materials into complex structural configurations on substrates. The assembled NW pitch is shown to be readily modulated through the surface chemical treatment of the receiver substrate, with the highest density approaching ~8 NW/um, ~95% directional alignment and wafer-scale uniformity. Furthermore, we demonstrate that our printing approach enables large-scale integration of NW arrays for various device structures on both Si and plastic substrates, with a controlled semiconductor channel width, and therefore ON current, ranging from a single NW (~10 nm) and up to ~250 um, consisting of a parallel array of over 1,250 NWs.

Fabrication of High-Compact Nanowires Using Alternating Photoresist Ashing and Spacer Technology

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Fabrication of Nano-Electromechanical Structures Down to 20 nm by Spacer Technology

Fabrication And Characterization Of Si Nanowire Scaling To 20 Nm By Spacer Technology

A facile nanowire fabrication approach based on edge lithography

A General Approach For Fabricating Arc-Shaped Composite Nanowire Arrays By Pulsed Laser Deposition

Fabrication of compact collateral silicon nanowires based on continuously alternating deposition

A General Approach for Fabricating Arc‐Shaped Composite Nanowire Arrays by Pulsed Laser Deposition

Parylene C-On-Photoresist (Pop): A Low Temperature Spacer Scheme For Polymer/Metal Nanowire Fabrication

Nonlithographic Fabrication of Nanostructured Micropatterns Via Breath Figures and Solution Growth

Mask-Free Patterning of High-Conductivity Metal Nanowires in Open Air by Spatially Modulated Femtosecond Laser Pulses

Three Dimensional Sculpturing of Vertical Nanowire Arrays by Conventional Photolithography

Wafer Scale Fabrication of Highly Dense and Uniform Array of Sub-5 Nm Nanogaps for Surface Enhanced Raman Scatting Substrates.

Wafer-Scale Assembly of Semiconductor Nanowire Arrays by Contact Printing

On-Wire Lithography

Self-modulated Taper Drawing of Silica Nanowires

Writing of nanowires via high viscosity-induced nano diffusive layer

Fabrication of Silicon Nanowire Arrays with Controlled Diameter, Length, and Density

Top-down fabrication of sub-30 nm monocrystalline silicon nanowires using conventional microfabrication

SPM-based Nanofabrication Using a Synchronization Technique

Fabrication of Conducting Si Nanowire Arrays