Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Integration of Tunable Two-Dimensional Nanostructures on a Chip by an Improved Nanosphere Lithography Method

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Monolayer Colloidal Mask with Tunable Interstice Size for Nanosphere Lithography

Physiochemical Coupled Dynamic Nanosphere Lithography Enabling Multiple Metastructures from Single Mask

Fabrication of dual patterned nanocavities using double layer nanosphere lithography

Controllable Two-Dimensional Photonic Crystal Patterns Fabricated by Nanosphere Lithography

New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching

Control of deposition channels in nanosphere templates for high-density nanodot array production

Tailoring Two-Dimensional Nanoparticle Arrays into Various Patterns

Tunable two-dimensional non-close-packed microwell arrays using colloidal crystals as templates.

Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography☆

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Aligned Stacking of Nanopatterned 2D Materials for High-Resolution 3D Device Fabrication

Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification

Unconventional Lithography for Patterned Nanomaterials

One-Step Dry-Etching Fabrication of Tunable Two-Hierarchical Nanostructures

Nanosphere Lithography from Template-Directed Colloidal Sphere Assemblies

Patterned Close-Packed Nanoparticle Arrays With Controllable Dimensions And Precise Locations

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation