Controllable Two-Dimensional Photonic Crystal Patterns Fabricated by Nanosphere Lithography

S Han,ZB Hao,J Wang,Y Luo
DOI: https://doi.org/10.1116/1.1978892
2005-01-01
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
Abstract:Two-dimensional (2D) photonic crystal patterns have been fabricated by an improved nanosphere lithography method. By introducing an intermediary SiO2 layer between the self-assembled layer and the substrate, this method can be applied to a wide range of materials without much concern for their surface hydrophilicity. The controllability of the photonic crystal patterns has also been investigated. The air-filling factor of the photonic crystal patterns can be easily tailored by thinning the polymer nanospheres in inductively coupled O2 plasma with a controllable etch rate. Large-area ordered 512nm pitch hole array, with vertical and smooth sidewalls, has been successfully formed on a GaAs substrate, indicating the potential application in photonic crystal devices of this method.
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