Abstract:Optical crystals are ideal materials for complex functional and durable optical components, but their good stability and hardness bring about difficulties in high-precision machining and require surface roughness below lambda/10. Femtosecond laser ablation is a widely applicable processing method indifferent to material types, but its 3D fabrication capability is limited by the accumulation of ablated debris and rough ablated surface. This work demonstrates a universal and flexible technology for the fabrication of crystalline micro-optics with required shape and surface roughness for the most demanding optical phase control. The cavitation-assisted ablation by a direct laser writing mode is followed by a high-temperature treatment to remove the rough non-crystalline layer caused by ablation. The annealing at temperatures below the melting point of the crystal reduces the roughness down to approximate to 2 nm without changing the structure shape. This virtue of maintaining the designed shape without change, which is impossible during thermal morphing of 3D surfaces of glasses, allows for a previously unavailable flexibility of surface finish for the most demanding optical micro-optical elements made in this study. This universal technology with nanoscale resolution and free-form 3D manufacturing capability is applicable for various crystals and provides a new way to fabricate micro-/integrated-optics and nonlinear optical elements.

Fabrication of Annular Photonic Crystals by Atomic Layer Deposition and Sacrificial Etching

Photonic Crystal Structures Fabricated By Nanosphere Lithography

Controllable Two-Dimensional Photonic Crystal Patterns Fabricated by Nanosphere Lithography

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

AFM Tip-Based Fabrication of Silicon Nanostructures with Reduced Subsurface Amorphous Layers

High-Q and High-Order Side-Coupled Air-Mode Nanobeam Photonic Crystal Cavities in Silicon

Precise Fabrication of Point Defects in Self-Assembled Three-Dimensional Macroporous Photonic Crystals.

High aspect ratio nano-fabrication of photonic crystal structures on glass wafers using chrome as hard mask

Free‐Form Micro‐Optics out of Crystals: Femtosecond Laser 3D Sculpturing

Photonic crystal fabrication in lithium niobate via pattern transfer through wet and dry etched chromium mask

Nanoscale multi-beam lithography of photonic crystals with ultrafast laser

Composite Silicon Nanostructure Arrays Fabricated on Optical Fibre by Chemical Etching of Multicrystal Silicon Film.

A three-dimensional optical photonic crystal with designed point defects

Double Etch Method for the Fabrication of Nanophotonic Devices from Van der Waals Materials

Metallic and Dielectric Photonic Crystals with Chiral Elements by Combined Nanoimprint and Reversal Lithography in SU-8

SCS nano-structures fabricated by hybrid process of HNA selective etching and oxidization

The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint

Femtosecond Laser Micro-Fabrication for Tailoring Photonic Crystals in Resins and Silica

Design of Annular Photonic Crystal Slabs

Double-layer Fabrication Scheme for Large-Area Polymeric Photonic Crystal Membrane on Silicon Surface by Multibeam Interference Lithography

Nanoimprint Fabrication of Planar Photonic and Plasmonic Crystals