Double-layer Fabrication Scheme for Large-Area Polymeric Photonic Crystal Membrane on Silicon Surface by Multibeam Interference Lithography

A. Ping Zhang,Ryszard Burzyński,Yong‐Kyu Yoon,Paras N. Prasad,Sailing He
DOI: https://doi.org/10.1364/ol.33.001303
2008-01-01
Abstract:We report on the fabrication of two-dimensional polymeric photonic crystal membranes on the surface of silicon using visible-light multibeam interference lithography. The structures are created by the interference of three beams of a green laser. A polymer buffer layer doped with a Rhodamine B laser dye, interlaid between the lithography layer and the silicon substrate, suppresses the effects of strong reflection and nonradiative absorption of silicon on the interference pattern. Large-area defect-free photonic crystal membranes are experimentally realized on silicon surface.
What problem does this paper attempt to address?