Abstract:Despite the continued scaling down of semiconductor manufacturing, traditional lithography-based nanofabrication only produces thin film structures, not 3-D shapes. 3-D nanofabrication remains a major challenge, especially for semiconductor materials. Most 3-D nanofabrication techniques, such as two-photon printing and stereolithography, mostly work for polymer materials, not solid-state semiconductor materials. Here, a method capable of fabricating sophisticated 3-D nanostructures of silicon based on the subsurface swelling phenomenon using focused helium ion swelling is reported. Silicon nanosphere arrays, hierarchical nanospheres mimicking compound lenses, nano-Taichi symbols, three-layer nanotowers, and nanopumpkins have been demonstrated, which are challenging for existing nanofabrication technology. The produced silicon nanostructures exhibit super small surface roughness as small as 0.1 nm, two orders of magnitude better than existing 3-D nanofabrication technologies normally above 10 nm. The super small surface roughness opens doors for many exciting applications in photonics, indicating small photon losses. Moreover, it is demonstrated ultraprecise fine-tuning of critical dimensions of ready-made nanostructures or nanodevices, such as tuning the tilting angle of the tip on the atomic force microscopy probe and reducing the nanogap between two metal electrodes from 200 to 4 nm, which is promising for improving nanodevice performances by tuning the critical dimensions to desired ranges.

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation (Adv. Mater. Interfaces 10/2022)

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Focused helium ion beam nanofabrication by near-surface swelling

Helium Ion‐Assisted Wet Etching of Silicon Carbide with Extremely Low Roughness for High‐Quality Nanofabrication (Small Methods 5/2024)

Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice.

Fabricating 3D Si nanostructure via a novel Ga+ implantation enabled maskless dry etching process

One-step Ion Beam Irradiation Manufacture of 3D Micro/nanopatterned Structures in SiC with Tunable Work Functions

3D Nanohelix Fabrication and 3D Nanometer Assembly by Focused Ion Beam Stress-Introducing Technique

3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication

SCS nano-structures fabricated by hybrid process of HNA selective etching and oxidization

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Focused-ion-beam-introduced Stress As a Driving Force for Three-Dimensional Micro/nano-Assembly

Fabricating Artificial Nanostructures with a Scanning Tunneling Microscope

3D Nanoscale Chiral Helixes Fabricated by Focused Helium Ion Beam Manufacturing Process

Fabrication of the Highly Ordered Silicon Nanocone Array With Sub-5 nm Tip Apex by Tapered Silicon Oxide Mask

Fabrication of Metal Suspending Nanostructures by Nanoimprint Lithography (NIL) and Isotropic Reactive Ion Etching (RIE)

Ultra-fine Nanofabrication by Hybrid of Energetic Ion Induced Fluidization and Stress

Ion beam lithography with gold and silicon ions

A strategy to fabricate nanostructures with sub-nanometer line edge roughness