Study on B-doped a-Si Film Deposited by Plasma Enhanced Chemical Vapor Deposition as Thermal Sensitive Material for Uncooled Infrared Detector

Ruifeng Yue,Liang Dong,Litian Liu
DOI: https://doi.org/10.3969/j.issn.1672-7126.2006.04.005
2006-01-01
Abstract:B-doped a-Si films for thermal-sensitive materials in uncooled infrared detectors were deposited by plasma enhanced chemical vapor deposition (PECVD). Dependence of electrical conductivity, hydrogen-contained amount and temperature coefficient of resistance of the films on deposited parameters such as gas flow, RF power and substrate temperature, were systemically studied, and therefore the optimal process parameters were obtained. Using this film as thermal-sensitive material, we developed an uncooled infrared detector with a detectivity of 2.17 × 10 8 cmHz 1/2W -1.
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