Research on Technology for Polycrystalline Silicon Film

王军,祁康成,成建波
DOI: https://doi.org/10.3969/j.issn.1009-6264.2004.04.002
2004-01-01
Abstract:The processing parameters for manufacturing amorphous silicon film were studied. The polycrystalline silicon film was obtained by annealing the amorphous silicon film. The crystallization of the film and the size of grains were investigated by XRD (X Ray Diffraction) and SEM (Scanning Electron Microscope). The results show that higher fraction of polycrystalline silicon and larger grain size in the film can be obtained for the amorphous silicon film annealed at higher temperature for longer time. The crystallization in the film occurs preferentially in direction (111) and grain size of 1 μm is observed, which is compared with the theoretical values.
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