Abstract:We have synthesized silicon nanocrystalline structures from thermal annealing of thin film amorphous silicon-based multilayers. The annealing procedure that was carried out in vacuum at temperatures up to 1100 °C is integrated in a X-ray diffraction (XRD) setup for real-time monitoring of the formation phases of the nanostructures. The microstructure of the crystallized films is investigated through experimental measurements combined with atomistic simulations of realistic nanocrystalline silicon (nc-Si) models. The multilayers consisting of uniformly alternating thicknesses of hydrogenated amorphous silicon and silicon oxide (SiO2) were deposited by plasma enhanced chemical vapor deposition on crystalline silicon and Corning glass substrates. The crystallized structure consisting of nc-Si structures embedded in an amorphous matrix were further characterized through XRD, Raman spectroscopy, and Fourier transform infrared measurements. We are able to show the different stages of nanostructure formation and how the sizes and the crystallized mass fraction can be controlled in our experimental synthesis. The crystallized silicon structures with large crystalline filling fractions exceeding 50% have been simulated with a robust classical molecular dynamics technique. The crystalline filling fractions and structural order of nc-Si obtained from this simulation are compared with our Raman and XRD measurements.

Microstructure and Conductivity of Large Area Nanocrystalline Silicon Films Grown by Specially Designed Thermal-Assisted Chemical Vapor Deposition

Nickel Induced Crystallization of Amorphous Silicon Thin Films

Crystallized Silicon Nanostructures - Experimental Characterization and Atomistic Simulations

Crystallization and Raman Shift of Array-Orderly Silicon Nanowires after Annealing at High Temperature

The Nc-Si Films With Controlled Crystal Structure And Electrical Conductivity Via The Re-Crystallization Approach

Formation of High Conductive Nano-Crystalline Silicon Embedded in Amorphous Silicon-Carbide Films with Large Optical Band Gap

Growth and Mechanical Properties of Amorphous and Nanostructured SiC films

Anomalously High Thermal Conductivity of Amorphous Si Deposited by Hot-Wire Chemical Vapor Deposition

Anomalously High Thermal Conductivity of Amorphous Silicon Films Prepared by Hot-Wire Chemical Vapor Deposition

Microstructures and Carrier Transport Behaviors of Nanocrystalline Silicon Thin Films

The Formation of High-Density Uniform Silicon Nanocrystals on Insulator Substrate and Their Surface Morphology

Effect of annealing on microstructure and photoluminescence of nano-composite silicon film

Influence of annealing on microstructures and photoluminescence of nano-composite silicon film

Enhancement of Thermal Conductivity of Hydrogenated Silicon Film by Microcrystalline Structure Growth

Structural Nature of Nanocrystalline Silicon

Fabrication and Characterization of Silicon Quantum Dots in Si-rich Silicon Carbide Films.

Columnar Growth of Crystalline Silicon Films on Aluminium-Coated Glass by Inductively Coupled Plasma CVD at Room Temperature

Evaluation Of Microstructures And Carrier Transport Behaviors During The Transition Process From Amorphous To Nanocrystalline Silicon Thin Films

Double Laser Crystallization (DLC) of 50 Nanometer and 20 Nanometer Amorphous Silicon Film for Thin Film Transistors (TFTS) Application

Microstructures and Characteristics of Nanosize Crystalline Silicon Films

Fabrication and Characterization of High Density Silicon Quantum Dots in Gradient Si-Rich Carbide Films