Influence of relaxation on the two-dimensional electron-gas in Al xGa1-xN/GaN/AlyGa1-yN double heterostructure with compressively strained GaN layer

Yuechan Kong,Youdou Zheng,Chunhong Zhou,Shulin Gu,Bo Shen,Rong Zhang,Yi Shi,Ping Han,Ruolian Jiang
DOI: https://doi.org/10.1109/icsict.2004.1435297
2004-01-01
Abstract:Influence of relaxation on the two-dimensional electron-gas (2DEG) in AlxGa1-xN/GaN/AlyGa1-yN double heterostructure (DH) is investigated by self-consistently solving the coupled Schrödinger and Poisson equations. The GaN channel layer is in compressive strain on a relaxed AlGaN lower barrier (LB) so as to improve Al content in the AlxGa1-xN top barrier (TB) to be double that in the LB (y) and hence the 2DEG density is greatly improved. It is found that the 2DEG sheet density increases with increasing Al content in the TB and achieves a maximum Ns=3.88 × 1013cm-2 at x=0.88 (with y=0.38), even behind the onset of relaxation at x=0.76, indicating the dominant influence of polarization effect and quantum confinement effect. Further increasing x will reduce AS due to significant relaxation. Taking relaxation R into account, the 2DEG sheet density increases with increasing the Al content in the AlyGa1-yN lower barrier (LB), opposite to the case of fully strained. © 2004 IEEE.
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