Two-dimensional electron gas density in high Al content AlxGa1-xN/GaN double heterostructure

yochan kong,y d zheng,chuanhong zhou,yuzhong deng,s l gu,bingxin shen,r j zhang,y j shi,pengdi han,ronglin jiang
DOI: https://doi.org/10.1109/IWJT.2004.1306792
2004-01-01
Abstract:Al content in AlxGa1-xN/GaN double heterostructure (DH) is improved high up to x=1 by using a compressively strained GaN quantum well (QW) layer. By solving the coupled Schrodinger and Poisson equations self-consistently, we investigate the two-dimensional electron gas (2DEG) distributions and sheet densities in AlxGa1-xN/GaN DHs. Comparing to the 2DEG in Al0.5Ga0.5N/GaN single heterostructure (SH), the 2DEG sheet density in a comparable AlN/GaN/Al0.5Ga0.5N DH is nearly doubled from 2.31×1013cm-3 to 4.47 × 1013cm-3, mainly owing to the additional piezoelectric polarization in the GaN QW. It is also shown that 2DEG in the GaN QW is increased with increasing the Al content of the top barrier due to the stronger polarization effect and large conduction band offset at the Al,Ga1-xN/GaN interface. Increasing the lower barrier thickness will reduce the 2DEG density in the GaN QW while the 2DEG at the lower AlyGa1-yN/GaN interface is increased, making the total 2DEG density almost a constant.
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