A Novel InxGa1−xN/InN Heterostructure Field-Effect Transistor with Extremely High Two-Dimensional Electron-Gas Sheet Density

YC Kong,YD Zheng,CH Zhou,YZ Deng,B Shen,SL Gu,R Zhang,P Han,RL Jiang,Y Shi
DOI: https://doi.org/10.1016/j.sse.2004.08.016
IF: 1.916
2005-01-01
Solid-State Electronics
Abstract:By self-consistently solving Schrödinger and Poisson equations, an extremely high two-dimensional electron-gas (2DEG) sheet density of 1.01×1014cm−2 is calculated in a novel InN-based InxGa1−xN/InN heterostructure field-effect transistor with an In content of x=0.1 and a doping level of Nd=1×1019cm−3 in the InxGa1−xN barrier layer. It is increased by almost one order of magnitude as compared to ∼1×1013cm−2 obtained in a conventional GaN-based Al0.2Ga0.8N/GaN heterostructure. With increasing In content of the InxGa1−xN barrier from x=0.05 to 0.15, the 2DEG sheet density decreases from 1.14×1014cm−2 to 0.91×1014cm−2 due to the decreased of polarization charges and the reduced conduction band offset. And the 2DEG density increases slightly with increasing doping level of the InxGa1−xN barrier.
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